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Non-contact sheet resistance mapping system
NC-300SCAN
- Rs : 0.05~2 ¥Ø/sq
- Applications : Cu film on silicon wafer (silicon wafer t : approx. 750¥ìm)
                                                          (Cu film thickness : 1000¢¦3000A)
- Sample sizes : up to 8"¦















 - Single sided eddy current probe(upper side) with air flouting
    - Diameter of probe : 10mm
    - Measuring range : 0.05 ~ 2 ohm/sq (at film thickness : approx.2000A)

 - Performance:
    - Conforms to ASTM F673
    - Measurement repeatability
         CV : less than 0.2% (30 times in stop condition) [CV=STDEVP/AVG¡¿100(%)]

 - Probing stage
   - High speed Y-¥èaxes motor controlled
         The measurement is performed from the circle of edge to inside, 
         
and the final is the center.
         Tact time : less than 90sec./121 points
   - Mechanical accuracy of stage
         ¥è-axis : repeatability of positional precision£º¡¾0.01¡Æ
         Y-axis : repeatability of positional precision£º¡¾0.05mm
   - The distance between single side probe and stage£º12.5mm