- Rs : 5.0mΩ/sq~1Ω/sq (option : up to 20Ω/sq)
- Applications : Al or other metal layers on silicon wafer (Film THK:20Angstrom~20μm)
- Sample sizes : 3”~8"Ф
- Layer thickness direct read out from sheet resistance with software - Min. 5 mm position from edge can be measured - Mapping software: Up to 121 points (Option) - Compatible for fully auto loading mechanism system (Option)